Which pattern method allows selection from specific start and endpoint?

The general pattern method is designed to provide flexibility in defining the geometry of a pattern. This method allows users to specify not just a uniform spacing between instances but also to select specific start and endpoint coordinates. This capability makes it ideal for scenarios where precise control over the placement of patterned elements is necessary, such as in complex assemblies or specific designs that require adherence to particular geometric constraints.

Other pattern methods like linear and circular typically operate based on predefined curves or angles, lacking the versatility to define arbitrary start and endpoints. The along method, while applicable in certain contexts, does not offer the direct control over arbitrary start and endpoint selection that the general method does. Thus, for tasks requiring this specific type of configuration, the general pattern method is the most suitable choice.